Hayashi Toshihiko | SiXON, Ltd.
スポンサーリンク
概要
関連著者
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MIYAZAKI Hisashi
Department of Physical Electronics, Tokyo Institute of Technology
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MORIMOTO Jun
Department of Materials Science and Engineering, National Defense Academy
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Morimoto J
Department Of Materials Science And Engineering National Defense Academy
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Shiomi Hiromu
Sixon Ltd.
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Passapong Wutimakun
Department of Materials Science and Engineering, National Defense Academy
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Mori Taichiro
Department of Materials Science and Engineering, National Defense Academy
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Hayashi Toshihiko
SiXON, Ltd.
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Mori Taichiro
Department Of Materials Science And Engineering National Defense Academy
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Hayashi Toshihiko
Sixon Ltd.
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Passapong Wutimakun
Department Of Materials Science And Engineering National Defense Academy
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Miyazaki Hisashi
Department Of Applied Physics Osaka City University
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Morimoto Jun
Department Of Applied Physics National Defense Academy
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Shiomi Hiromu
SiXON, Ltd.
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Morimoto Jun
Department Of Materials Science And Engineering National Defense Academy
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OKAMOTO Yoichi
Department of Materials Science and Engineering, National Defense Academy
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Okamoto Y
Department Of Materials Science And Engineering National Defense Academy
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Okamoto Yoichi
Department Of Applied Physics National Defense Academy
著作論文
- P3-34 Nonradiative Recombination Process in Semi-insulating 6H-SiC Bulk Single Crystals Evaluated by Photoacoustic Spectroscopy(Poster session 3)
- P3-33 Thermal Diffusivity of Semi-Insulating 6H-SiC Single Crystal Wafers Evaluated by Photopyroelectric (PPE) Method(Poster session 3)