KADOMURA Shingo | ULSI R & D Laboratories, Sony Corporation
スポンサーリンク
概要
関連著者
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Fukuda Seiichi
Ulsi R & D Laboratories Sony Corporation
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Tatsumi Tetsuya
Ulsi R & D Laboratories Sony Corporation
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Tatsumi Tetsuya
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies (aset)
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KADOMURA Shingo
ULSI R & D Laboratories, Sony Corporation
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Fukuda Shigekazu
The Institute Of Physical And Chemical Research (riken)
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Kadomura Shingo
Ulsi R & D Laboratories Sony Corporation
著作論文
- Radiation Damage of SiO_2 Surface Induced by Vacuum Ultraviolet Photons of High-Density Plasma
- Etch Rate Acceleration of SiO_2 during Wet Treatment after Gate Etching