Yeom Han | Institute Of Physics And Applied Physics Yonsei Univrsity
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概要
関連著者
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Yeom Han
Institute Of Physics And Applied Physics Yonsei Univrsity
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Choi Y
Yonsei Univ. Seoul Kor
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Sugino Osamu
Institute Of Applied Physics The University Of Tsukuba
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CHOI Youn
Institute of Physics and Applied Physics, Yonsei Univrsity
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LEE Joon
Institute of Physics and Applied Physics, Yonsei Univrsity
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CHOI Won
Institute of Physics and Applied Physics, Yonsei Univrsity
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IM Seongil
Institute of Physics and Applied Physics, Yonsei Univrsity
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Yu Byung
Department Of Liberal Arts And Science Hankuk Aviation University
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Im Seongil
Institute Of Physics And Applied Physics Yonsei Univrsity
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Ohno Takahisa
National Institute For Materials Science
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Choi Youn
Institute Of Physics And Applied Physics Yonsei Univrsity
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PARK Kyoungwan
Department of Nano Science & Technology, University of Seoul
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Choi Won
Institute Of Physics And Applied Physics Yonsei Univrsity
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Lee Joon
Institute Of Physics And Applied Physics Yonsei Univrsity
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Kong Ki-jeong
Korea Research Institute of Chemical Technology, P. O. Box 107, Daejeon 305-600, Korea
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Kim Hanchul
Korea Research Institute of Standards and Science, P. O. Box 102, Daejeon 305-600, Korea
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Chung Chun-Hyung
Institute of Physics and Applied Physics, Yonsei University, Seoul 120-749, Korea
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Lyo In-Whan
Institute of Physics and Applied Physics, Yonsei University, Seoul 120-749, Korea
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Miyamoto Yoshiyuki
Fundamental Research Labs., NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
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Sugino Osamu
Institute for Solid State Physics, University of Tokyo, Kashiwa, Chiba 277-8581, Japan
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Ohno Takahisa
National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
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Yeom Han
Institute of Physics and Applied Physics, Yonsei University, Seoul 120-749, Korea
著作論文
- Optimum Thickness of SiO_2 Layer Formed at the Interface of N-ZnO/P-Si Photodiodes
- First-Principles Study of the Step Oxidation at Vicinal Si(001) Surfaces