Tajima Kazuki | Semiconductor Business Unit Dowa Mining Co. Ltd.
スポンサーリンク
概要
関連著者
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NARUSHIMA Takayuki
Department of Materials Processing, Tohoku University
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井口 〓孝
Department Of Materials Processing Tohoku University
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Tajima Kazuki
Semiconductor Business Unit Dowa Mining Co. Ltd.
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IGUCHI Yasutaka
Department of Metallurgy, Tohoku University
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Narushima Takayuki
Department Of Materials Processing Graduate School Of Engineering Tohoku University
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Iguchi Yasutaka
Department Of Materials Processing Tohoku University
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OUCHI Chiaki
Department of Materials Processing, Tohoku University
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Tajima Kazuki
Department Of Thoracic Surgery Nagoya Daini Red Cross Hospital
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Tajima Kazuki
Department Of Cardiovascular Surgery Nagoya Daini Red Cross Hospital
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Ouchi C
Department Of Materials Processing Tohoku University
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Ouchi Chiaki
Tohoku University
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Ouchi Chiaki
Department Of Metallurgy Tohoku University
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Ouchi Chiaki
Department Of Materials Processing Graduate School Of Engineering Tohoku University
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成島 尚之
Department Of Materials Processing Tohoku University
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YAMADA Tsuyoshi
Compound Semiconductor Wafer Dept., Dowa Semiconductor Co., Ltd.
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KUDO Taku
Compound Semiconductor Wafer Dept., Dowa Semiconductor Co., Ltd.
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OTSUKA Akira
Semiconductor Business Unit, Dowa Mining Co., Ltd.
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OGASAWARA Takuma
Department of Metallurgy, Graduate School of Engineering, Tohoku University
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HINO Yuta
Department of Metallurgy, Graduate School of Engineering, Tohoku University
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Hino Yuta
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Kudo Taku
Compound Semiconductor Wafer Dept. Dowa Semiconductor Co. Ltd.
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Narushima Takayuki
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Iguchi Yasutaka
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Otsuka Akira
Semiconductor Business Unit Dowa Mining Co. Ltd.
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Ogasawara Takuma
Department Of Metallurgy Graduate School Of Engineering Tohoku University
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Iguchi Y
Department Of Materials Processing Tohoku University
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Yamada Tsuyoshi
Compound Semiconductor Wafer Dept. Dowa Semiconductor Co. Ltd.
著作論文
- Boron and Nitrogen in GaAs and InP Melts Equilibrated with B_2O_3 Flux
- Behavior of Oxygen in Ga-As Melts with the Range of As Content up to 5 mass % Equilibrated with B_2O_3 Flux
- Activity of Ga_2O_3 in B_2O_3 Flux and Standard Free Energies of Formation of CaBO_3 and InBO_3