Hiraga Kenta | Department of Physics, Faculty of Engineering, Yokohama National University, Yokohama 240-8501, Japan
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- Department of Physics, Faculty of Engineering, Yokohama National University, Yokohama 240-8501, Japanの論文著者
Department of Physics, Faculty of Engineering, Yokohama National University, Yokohama 240-8501, Japan | 論文
- Local Valence Electronic States of SiO2 Ultrathin Films Grown on Si(100) Studied Using Auger Photoelectron Coincidence Spectroscopy: Observation of Upward Shift of Valence-Band Maximum as a Function of SiO2 Thickness
- Oxynitride Formation Processes on Si(001) Studied by Means of Reflectance Difference Spectroscopy
- Oxynitride Formation Processes on Si(001) Studied by Means of Reflectance Difference Spectroscopy