Taniguchi Ichiro | Department of Electrical Engineering, Faculty of Engineering, Doshisha University
スポンサーリンク
概要
Department of Electrical Engineering, Faculty of Engineering, Doshisha University | 論文
- Silicorn Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition
- Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition frorn Silicon Tetraacetate
- Optimum Conditions for NO Reduction Using Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- Structure and tribological properties of Ti-Al-N films prepared by plasma-based ion implantation mixing
- Deposition of Tungsten Carbide Thin Films by Simultaneous RF Sputtering