Yasuda Hideyuki | Department of Adaptive Machine Systems, Osaka University|Department of Materials Science and Engineering, Kyoto University
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- Yasuda Hideyukiの詳細を見る
- 同名の論文著者
- Department of Adaptive Machine Systems, Osaka University|Department of Materials Science and Engineering, Kyoto Universityの論文著者
論文 | ランダム
- Enhancement of Etch Rate by the Addition of O_2 and Ar in Chemical Dry Etching of Si Using a Discharge Flow of Ar/CF_4 and CF_4/O_2 Gas Mixtures
- Downflow Etching of Si Using a Microwave-Excited Discharge Plasma of Ar/CF_4 Mixtures
- An Efficient Decomposition of NO into N_2 and O_2 in a Fast Discharge Flow of NO/He Mixtures
- Chemical Dry Etching of Si Substrate in a Discharge Flow Using Ar/CF_4 Gas Mixtures
- Surface of Bi_2Sr_2CaCu_2O_y Single Crystals Heated in Air