藤井 雅雄 | Central Research Laboratory Mitsubishi Electric Corp.
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概要
Central Research Laboratory Mitsubishi Electric Corp. | 論文
- Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma : A-1: DEVICE TECHNOLOGY (I)
- Persistent Current in Y-Ba-Co Oxides Superconductor at Liquid Nitrogen Temperature
- A New Undercutting Phenomenon in Plasma Etching
- X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
- Sputtered W-Ti Film for X-Ray Mask Absorber