Tokunaga Kenichi | ULSI Device Development Laboratories, NEC Corp., 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japan
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概要
- Tokunaga Kenichiの詳細を見る
- 同名の論文著者
- ULSI Device Development Laboratories, NEC Corp., 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japanの論文著者
ULSI Device Development Laboratories, NEC Corp., 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japan | 論文
- Recent Progress in Electron-Beam Cell Projection Techology
- Coulomb Interaction Effect in Cell Projection Lithography
- 0.15 μm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication
- Improved Proximity Effect Correction Technique Suitable for Cell Projection Electron Beam Direct Writing System
- 0.15 µm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication