Aoki Akira | Department of Radiation Chemistry, Industrial Research Institute
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概要
論文 | ランダム
- Formation of Selective High Barrier Region by Inductively Coupled Plasma Treatment on GaN-Based Light-Emitting Diodes
- Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering
- Nanoscale Selective Plasma Etching of Ultrathin HfO2 Layers on GaAs for Advanced Complementary Metal–Oxide–Semiconductor Devices
- Field Emission from Individual Free-Standing Carbon Nanotubes
- Dielectric Relaxation Analysis of Single-Stranded DNA in Liquid Crystals