Oku Yoshiaki | MIRAI Project, Association of Super-Advanced Electronics Technologies (ASET), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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- MIRAI Project, Association of Super-Advanced Electronics Technologies (ASET), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japanの論文著者
MIRAI Project, Association of Super-Advanced Electronics Technologies (ASET), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan | 論文
- Integration of Self-Assembled Porous Silica in Low-$k$/Cu Damascene Interconnects
- Plasma-Enhanced Co-Polymerization of Organo-siloxane and Hydrocarbon for Low-$k$/Cu Interconnects
- Plasma Etch Rates of Porous Silica Low-$k$ Films with Different Dielectric Constants
- Recovery from Plasma-Process-Induced Damage in Porous Silica Low-$k$ Films by Organosiloxane Vapor Annealing