SAKIYAMA K. | VLSI Development Laboratories, Tenri IC Group, Sharp Corporation

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• SAKIYAMA K.の詳細を見る
• 同名の論文著者
• VLSI Development Laboratories, Tenri IC Group, Sharp Corporationの論文著者

VLSI Development Laboratories, Tenri IC Group, Sharp Corporation | 論文

• An Advanced Shallow SIMOX/CMOS Technology for High Performance Portable Systems (Special Issue on SOI Devices and Their Process Technologies)
• The Control of Sidelobe Intensity with Arrangement of the Chrome Pattern (COSAC) in Half-Tone Phase-Shifting Mask

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