An Advanced Shallow SIMOX/CMOS Technology for High Performance Portable Systems (Special Issue on SOI Devices and Their Process Technologies)

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概要

• 論文の詳細を見る

• A 0.35μm CMOS process for low-voltage, high-performance applications implemented in an ultra-thin-film SIMOX wafer: Shallow SIMOX, is described. Fully Depleted CMOS devices are realized in a 50nm thick top Si film. Stable high speed, low-Vth transistors for low-voltage operation were developed by integrating a salicided dual gate process. Short-channel effects are suppressed by a novel channel-drain profile engineering. Low power consumption is achieved by the reduced diffusion capacitance of the SIMOX device and a thick, CMP planarized, intermetal dielectric to reduce metal interconnect capacitance's. Compared with the Bulk-Si CMOS devices, a factor of 1/5 reduction on power dissipation is achieved with this technology. A high ESD strength of 4kV (HBM) demonstrates the applicability of this technology in advanced high-performance Products.

• 社団法人電子情報通信学会の論文
• 1997-03-25

著者

• Naka Toshio

  Vlsi Development Laboratories Tenri Ic Group Sharp Corporation

• Adan Alberto

  Vlsi Development Laboratories Tenri Ic Group Sharp Corporation

• Kaneko S

  Mitsubishi Electric Corp. Kamakura‐shi Jpn

• KANEKO Seiji

  VLSI Development Laboratories, Tenri IC Group, Sharp Corporation

• URABE Daizo

  VLSI Development Laboratories, Tenri IC Group, Sharp Corporation

• HIGASHI Kenichi

  VLSI Development Laboratories, Tenri IC Group, Sharp Corporation

• FUKUSHIMA Yasumori

  VLSI Development Laboratories, Tenri IC Group, Sharp Corporation

• TAKAMATSU Soshu

  VLSI Development Laboratories, Tenri IC Group, Sharp Corporation

• HIDESHIMA Shogo

  VLSI Development Laboratories, Tenri IC Group, Sharp Corporation

• KAGISAWA Atsushi

  VLSI Development Laboratories, Tenri IC Group, Sharp Corporation

• Urabe Daizo

  Vlsi Development Laboratories Tenri Ic Group Sharp Corporation

• Takamatsu Soshu

  Vlsi Development Laboratories Tenri Ic Group Sharp Corporation

• Hideshima Shogo

  Vlsi Development Laboratories Tenri Ic Group Sharp Corporation

• Higashi Kenichi

  Vlsi Development Laboratories Tenri Ic Group Sharp Corporation

• Kagisawa Atsushi

  Vlsi Development Laboratories Tenri Ic Group Sharp Corporation

• Fukushima Yasumori

  Vlsi Development Laboratories Tenri Ic Group Sharp Corporation

関連論文

• SOI Device Technology for Low-Voltage and High-Performance Portable Communication Systems
• An Advanced Shallow SIMOX/CMOS Technology for High Performance Portable Systems (Special Issue on SOI Devices and Their Process Technologies)

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