OHMI K. | Department of Electronics, Faculty of Engineering, Tohoku University
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概要
Department of Electronics, Faculty of Engineering, Tohoku University | 論文
- Ultra Low-Temperature Growth of High-Integrity Thin Gate Oxide Films by Low-Energy Ion-Assisted Oxidation
- Native Oxide Growth on Silicon Surface in Ultrapure Water and Hydrogen Peroxide
- Instability of an Interface Between Two Immiscible Fluids Under a Vertical Oscillation : Fluids Engineering
- Minimizing Wafer Surface Damage and Chamber Material Contamination in New Plasma Processing Equipment
- High-Reliability Lithography Performed by Ultrasonic and Surfactant-Added Developing System