Ahn Y. | Department of Materials Engineering and Center for Advanced Plasma Surface Technology, SungKyunKwan University, Suwon, Kyunggi-do 440-746, Korea
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- Department of Materials Engineering and Center for Advanced Plasma Surface Technology, SungKyunKwan University, Suwon, Kyunggi-do 440-746, Koreaの論文著者
Department of Materials Engineering and Center for Advanced Plasma Surface Technology, SungKyunKwan University, Suwon, Kyunggi-do 440-746, Korea | 論文
- Formation and Properties of Epitaxial CoSi2 Layers on p-Si0.83Ge0.17/p-Si(001) using a Si Capping Layer by Metal-Organic Chemical Vapor Deposition
- Formation of Nickel Silicide Layer on Strained-Si0.83Ge0.17/Si(001) using a Sacrificial Si Layer and its Morphological Instability