Shiono Daiju | Tokyo Ohka Kogyo Co., Ltd.
スポンサーリンク
概要
Tokyo Ohka Kogyo Co., Ltd. | 論文
- Low-E_a Chemical Amplification Resists for 193nm Lithography
- X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Reactivity of Halogenated Resist Polymer with Low-Energy Electrons
- Proton Dynamics in Chemically Amplified Electron Beam Resists