Eimori Takahisa | Advanced Device Development Department, Renesas Technology Corporation
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概要
Advanced Device Development Department, Renesas Technology Corporation | 論文
- W-Polymetal Gate with Low W/Poly-Si Interface Resistance for High-Speed/High-Density Embedded Memory
- W-Polymetal Gate with Low W/Poly-Si Interface Resistance for High-Speed/High-Density Embedded Memory