Oka Yoshihide | Takasaki Works, Hitachi Ltd.
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概要
Takasaki Works, Hitachi Ltd. | 論文
- Effects of Refraction of X-Rays in Double-Crystal Topography : Techniques, Instrumentations and Measurement
- Novel Gate-Protection Devices for MOSFET's : A-3: LSI-2
- Low-frequency Low-noise Transistors Fabricated by Double Ion Implantation : A-1: ADVANCED LITHOGRAPHY AND PROCESS