Hikosaka Kohki | Department of Applied Electronics, Tokyo Institute of Technology
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概要
Department of Applied Electronics, Tokyo Institute of Technology | 論文
- An Amorphous-Silicon Film Usable at High-Temperature : Annealing Properties of a New Fluorinated Amorphous-Silicon : II-2: AMORPHOUS FILM PREPARATION AND CHARACTERIZATION (II)
- A Comparison of the Thermal Stabilities of Fluorinated and Hydrogenated Amorphous-Silicons
- Hall Mobility of Low-Temperature-Deposited Polysilicon Films by Catalytic Chemical Vapor Deposition Method
- Detection of Oil Leakage in SAR Images Using Wavelet Feature Extractors and Unsupervised Neural Classifiers(Special Issue on Advances in Radar Systems)
- Detection of Radar Targets Embedded in Sea Ice and Sea Clutter Using Fractals, Wavelets, and Neural Networks(Special Issue on Advances in Radar Systems)