Inoue Ken | Electrical Engineering, Hosei University Koganei
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概要
Electrical Engineering, Hosei University Koganei | 論文
- Properties of Titanium Nitride Films for Barrier Metal in Aluminum Ohmic Contact Systems
- Damage Induced by Electron Cyclotron Resonance Plasma Etching on Silicon Surface
- Dose and Damage Measurements in Low Dose Ion Implantation in Silicon by Photo-Acoustic Displacement and Minority Carrier Lifetime