Jang Hanbyeol | Department of Control and Instrumentation Engineering, Korea University, Jochiwon, Chungnam 339-700, Republic of Korea
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- Department of Control and Instrumentation Engineering, Korea University, Jochiwon, Chungnam 339-700, Republic of Koreaの論文著者
Department of Control and Instrumentation Engineering, Korea University, Jochiwon, Chungnam 339-700, Republic of Korea | 論文
- Kinetics of Chemical Changes in Phenol Formaldehyde Based Polymeric Films Etched in N2O and O2 Inductively Coupled Plasmas: A Comparative Study
- Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl2/Ar Inductively Coupled Plasma
- Etching Behavior and Mechanism of In- and Ga-Doped ZnO Thin Films in Inductively Coupled BCl3/Cl2/Ar Plasmas