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Technical Association of Photopolymers, Japan | 論文
- Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography
- New Strategies for High Resolution Photoresists
- Study on Photobase Generation from α-Aminoketones: Photocrosslinking of Epoxides with Carboxylic Acids
- Development of Photo-Curable Pressure Sensitive Adhesives with UV Cationic Curing of Epoxy Resins
- Issues and Perspectives for Giga to Tera Scale Integration
- Characterization of Blockcopolymers,Synthesized with Photo-macroinitiators Having Acetophenone-type End-groups
- Surface Modification of Polymeric Films by Atmospheric Plasma Treatment
- Line Edge Roughness and Development Rate Analysis Based on Random Reaction/Percolation Model for Chemically Amplified Resists
- A HFIPS-based Polymer Approach for 157 nm Single Layer Photoresist
- Impact of Developers on Roughness of Dissolution Front in Electron-beam Resists
- Supercritical Drying for Nanostructure Fabrication
- Carbon structure in polyimide membrane formed by ion irradiation
- Improving the Process Capability of SU-8, Part 3
- Recent Progress in Organic Bottom Anti-reflective Coatings
- Photopolymer Materials for Holography
- Optically Controlled Alignment of Nematic Liquid Crystals on Photo-sensitive Polymers
- Synthesis and Imaging Performances of a New Type PAC
- Advanced RELACS Technology for ArF Resist
- A new materials-based pitch division technique
- Development of Low-Retardation TAC Films for Protection Films of LCD's Polarizer