Study on Effects of Hydrogen Flow Rates on the Properties of ZnO Thin Film Deposited by Facing Targets Sputtering System (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
スポンサーリンク
概要
著者
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Hori Masaru
NU--SKKU Joint Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Choi Yoon
NU--SKKU Joint Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Han Jeon
NU--SKKU Joint Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Kim Hye
NU--SKKU Joint Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Wen Long
NU--SKKU Joint Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Jin Su
NU--SKKU Joint Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
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Choi In
NU--SKKU Joint Institute for Plasma-Nano Materials, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea
関連論文
- Study on Effects of Hydrogen Flow Rates on the Properties of ZnO Thin Film Deposited by Facing Targets Sputtering System
- Study on Effects of Hydrogen Flow Rates on the Properties of ZnO Thin Film Deposited by Facing Targets Sputtering System (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)