Oxygen Dispersive Diffusion Induced Bias stress Instability in Thin Active Layer Amorphous ln-Ga-Zn-O Thin-Film Transistors
スポンサーリンク
概要
著者
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Lee Gwang
Nano and Bio Technology Research Division, Daegu Gyeongbuk Institute of Science and Technology, Daegu 711-873, Korea
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Jeong Jaewook
Nano and Bio Technology Research Division, Daegu Gyeongbuk Institute of Science and Technology, Daegu 711-873, Korea
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Kim Joonwoo
Nano and Bio Technology Research Division, Daegu Gyeongbuk Institute of Science and Technology, Daegu 711-873, Korea
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Kim Junghye
Nano and Bio Technology Research Division, Daegu Gyeongbuk Institute of Science and Technology, Daegu 711-873, Korea
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Choi Byeongdae
Nano and Bio Technology Research Division, Daegu Gyeongbuk Institute of Science and Technology, Daegu 711-873, Korea
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JEONG Jaewook
Nano and Bio Technology Research Division, Daegu Gyeongbuk Institute of Science and Technology
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CHOI Byeongdae
Nano and Bio Technology Research Division, Daegu Gyeongbuk Institute of Science and Technology
関連論文
- Oxygen Dispersive Diffusion Induced Bias Stress Instability in Thin Active Layer Amorphous In--Ga--Zn--O Thin-Film Transistors
- Oxygen Dispersive Diffusion Induced Bias stress Instability in Thin Active Layer Amorphous ln-Ga-Zn-O Thin-Film Transistors
- Oxygen Dispersive Diffusion Induced Bias Stress Instability in Thin Active Layer Amorphous In-Ga-Zn-O Thin-Film Transistors