Gate-Leakage and Carrier-Transport Mechanisms for Plasma-PH Passivated InGaAs N-Channel Metal-Oxide-Semiconductor Field-Effect Transistors (Special Issue : Solid State Devices and Materials (1))
スポンサーリンク
概要
著者
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Suleiman Sumarlina
Department of Electrical and Computer Engineering, National University of Singapore, Singapore 1175761
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Lee Sungjoo
SKKU Advanced Institute of Nano Technology (SAINT) and School of Information and Communication Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea