High-Density Electron-Beam Recording of Circumferentially Aligned Dots by Using Substrates with Low Atomic Numbers

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概要

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• Reducing proximity effects is a key factor for achieving a higher resolution in electron-beam lithography and realizing the mastering of patterned media. The effect of substrate materials on backscattering electrons was investigated by simulation and experiment, and resolution enhancement was demonstrated. In Monte Carlo simulations with 100 keV incident electrons, the intensity of backscattering electrons decreased with decreasing atomic number of substrates. On the other hand, both the density of substrates and the existence of 10 nm thin films had negligible effects on the intensity of backscattering electrons. The measured exposure distributions from line-scanned electron beams supported the results of simulations. The intensity of backscattering electrons was reduced by using a carbon substrate, and circumferentially aligned high-density patterns of 878 Gbit/in.2 were resolved.

• 2012-01-25

著者

• Okada Takeru

  Pioneer Corporation, Tokorozawa, Saitama 359-1167, Japan

• Aida Makoto

  Pioneer Corporation, Tokorozawa, Saitama 359-1167, Japan

• Fujimori Jiro

  Pioneer Corporation, Tokorozawa, Saitama 359-1167, Japan

• Katsumura Masahiro

  Pioneer Corporation, Tokorozawa, Saitama 359-1167, Japan

• Iida Tetsuya

  Pioneer Corporation, Tokorozawa, Saitama 359-1167, Japan

関連論文

• High-Density Electron-Beam Recording of Circumferentially Aligned Dots by Using Substrates with Low Atomic Numbers

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