Low energy Xe[+] ion beam machining of the ultralow expansion glass substrates for aspherical extreme ultraviolet lithography projection optics (Special issue: Microprocesses and nanotechnology)

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概要

• 論文の詳細を見る

著者

• Endo Hironori

  Tokyo University of Science, Noda, Chiba 278-8510, Japan

• Yamada Junya

  Tokyo University of Science, Noda, Chiba 278-8510, Japan

• Pahlovy Shahjada

  Tokyo University of Science, Noda, Chiba 278-8510, Japan

• Miyamoto Iwao

  Tokyo University of Science, Noda, Chiba 278-8510, Japan

関連論文

• Low energy Xe[+] ion beam machining of the ultralow expansion glass substrates for aspherical extreme ultraviolet lithography projection optics (Special issue: Microprocesses and nanotechnology)

スポンサーリンク