Positive-working photoresist based on a first-generation dendrimer consisting of 3,5-bis(tetrahydropyranyloxy)benzyl units
スポンサーリンク
概要
著者
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ITO Yumiko
Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
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Ito Yumiko
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Ueda Mitsuru
Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
関連論文
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