Development of new negative-tone molecular resists based on calixarene for EUV lithography

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Oizumi Hiroaki

  Selete (semiconductor Leading Edge Technol. Inc.) Ibaraki Jpn

• Itani Toshiro

  Selete (semiconductor Leading Edge Technol. Inc.) Ibaraki Jpn

関連論文

• Development of new negative-tone molecular resists based on calixarene for EUV lithography

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