Internal photoemission over HfO2 and Hf(1-x)Si[x]O2 high-k insulating barriers: band offset and interfacial dipole characterization (Special issue: Solid state devices and materials)
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- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics | 論文
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