UV nanoimprint lithography and its application for nanodevices

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Ono Hiroshi

  Nagaoka Univ. Technol. Nagaoka Jpn

• Hirasawa Tamano

  Toyo Gosei Co. Ltd Chiba Jpn

関連論文

• Effect of sensitizer addition on holographic PDLC formation (光エレクトロニクス)
• Effect of sensitizer addition on holographic PDLC formation (有機エレクトロニクス)
• Diffraction Properties of Nematic Phase Gratings with Photoregulated Liquid Crystal Cells
• Holographic Recording in Photoreactive Monomer/Polymer Composites
• Two-Dimensional Crossed Polarization Gratings in Photocrosslinkable Polymer Liquid Crystals
• Extremely High Degree Photoinduced In-Plane Reorientation in Azobenzene-Containing Polymer Liquid Crystal Film Using 633nm Light
• Polarization Gratings in Photocrosslinkable Polymer Liquid Crystals Prepared Using Two-Step Ultraviolet Exposure
• Control of Thermally Enhanced Photoinduced Reorientation Direction of Photocrosslinkable Copolymer Liquid Crystals and Application to Polarization Gratings Using Linearly Polarized Ultraviolet Light
• Photoinduced Reorientation of Polymethacrylate Film with 4-Methoxyazobenzene Side Groups Using Linearly Polarized He-Ne Laser and Annealing
• UV nanoimprint lithography and its application for nanodevices

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