Bilayer Resists for 193 nm Lithography: SSQ and POSS

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Ito Hiroshi

  Japan Steel Works Ltd. Hiroshima‐city Jpn

関連論文

• Bilayer Resists for 193 nm Lithography: SSQ and POSS
• Characterization and Lithographic Performance of Silsesquioxane 193 nm Bilayer Resists
• Short-Term Forecasting of Landings of Ocellate Puffer Takifugu rubripes Migrating around a Spawning Area in the Inland Sea of Japan

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