Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Thiyagarajan Muthiah

  Az Electronic Materials Usa Corp. Nj Usa

関連論文

• Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone

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