New Alicyclic Polymers Based on Protected Dinorbornene Monomers for Application as Deep UV Resists

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Ahn K‐d

  Korea Inst. Sci. And Technol. Seoul Kor

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• New Alicyclic Polymers Based on Protected Dinorbornene Monomers for Application as Deep UV Resists

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