Novel Polymeric Resists Based on Vinyl Ether Functionality--Photochemistry and Evaluation as a Lithographic Resist for Synchrotron X-ray and Deep UV

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Suzuki T

  Saitama Inst. Technol. Saitama Jpn

関連論文

• Novel Polymeric Resists Based on Vinyl Ether Functionality--Photochemistry and Evaluation as a Lithographic Resist for Synchrotron X-ray and Deep UV

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