Highly Sensitive Electron-Beam Negative Resists Utilizing Phenylcarbinol as Dissolution-Inhibitor Precursor

スポンサーリンク

概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Uchino S

  Hitachi Ltd. Tokyo Jpn

• Ueno T

  Hitachi Ltd. Ibaraki

関連論文

• Nanofabrication with a Novel EB System with a Large and Stable Beam Current
• Highly Sensitive Electron-Beam Negative Resists Utilizing Phenylcarbinol as Dissolution-Inhibitor Precursor

スポンサーリンク