Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitive Polyimides

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Yamaoka T

  Chiba Univ. Chiba Jpn

関連論文

• Cyclocopolymer of N-cyclohexyldimethacrylamide and Application to a Photoresist with Photo-Acid Generator
• Synthesis of Cyclized Copolymer from N-Substituted Dimethacrylamide and Application to a Photoresist with a Photo-Acid Generator
• Cyclized Copolymer of Methacrylic Anhydride and an Application to Photoresist with Photo-Acid Generator
• Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitive Polyimides

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