A Sensitive Positive Resist for 0.1μm Electron-Beam Direct Writing Lithography

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Arai T

  Hitachi Ltd. Tokyo Jpn

• Sakamizu T

  Hitachi Ltd. Tokyo Jpn

関連論文

• Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography
• A Sensitive Positive Resist for 0.1μm Electron-Beam Direct Writing Lithography

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