Antireflection coatings with SiO
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概要
- 論文の詳細を見る
In this study, we used SiO<inf>x</inf>–TiO<inf>2</inf>multilayer antireflective coatings to achieve optical average transmittances of 94.93 and 98.07% for one-sided and double-sided coatings on a glass substrate, respectively. A SiO<inf>x</inf>film was employed as the material with a low refractive index and a TiO<inf>2</inf>film as the material with a high refractive index. Results showed that when any layer thickness of the SiO<inf>x</inf>–TiO<inf>2</inf>nano-multilayer (NML) structure is much less than the wavelength of visible light, the SiO<inf>x</inf>–TiO<inf>2</inf>thickness ratio can be used to adjust the optical refractive index of the entire NML film. In this study, we produced dense antireflective coatings of three layers (SiO<inf>x</inf>, TiO<inf>2</inf>, and SiO<inf>x</inf>–TiO<inf>2</inf>NML/glass substrate) and four layers (SiO<inf>x</inf>, TiO<inf>2</inf>, SiO<inf>x</inf>, and TiO<inf>2</inf>/glass substrate) with film thicknesses and refractive indices controlled by reactive magnetron sputtering. Thermal treatment at 600 °C in an air atmosphere was also shown to reduce the absorption of visible light, resolving the issue of degraded transparency caused by increasing sputtering speed. The microhardness of the antireflective film was 8.44 GPa, similar to that of the glass substrate. Process window analysis demonstrated the feasibility of the antireflective coating process window from an engineering standpoint. The thickness of the film deviated by less than 10% from the ideal thickness, corresponding to a 98% transmittance range, and the simulation and experimental results were relatively consistent.
- Institute of Physicsの論文
- 2014-10-02