Real-time characteristic impedance monitoring for end-point and anomaly detection in the plasma etching process

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概要

• 論文の詳細を見る
• Institute of Physicsの論文
• 2014-03-05

著者

• Motomura Taisei

  Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology, Tosu, Saga 841-0052, Japan.

関連論文

• Real-time characteristic impedance monitoring for end-point and anomaly detection in the plasma etching process

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