Effects of Al and V Additions on Mechanical Response in Thick TiSiCN Nanocomposites Deposited Using Plasma-Enhanced Magnetron Sputtering

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概要

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• Thick TiSiCN and TiAlVSiCN nanocomposite coatings were fabricated by plasma-enhanced magnetron sputtering (PEMS). Characterizations by electron probe microanalyzer (EPMA) and XRD revealed the dependence of films with various precursor flow rates on the constituent composition and structure evolution in coatings. HRTEM images clearly confirmed that a nanocomposite structure existed with grain size below 10 nm. It was believed that nanocrystalline TiC<inf>x</inf>N<inf>1-x</inf>-based phases with B1 structure were embedded in an amorphous SiC<inf>y</inf>N<inf>z</inf>matrix, and such phase segregation ameliorated the hardness and H/E ratios. In the scratch and ball-on-disc wear tests, the evidence from crack initiation resistance, friction coefficient, and worn surfaces verified that thick nanocomposites exhibited remarkable tribological resistance. Hybrid anti-wear mechanisms on the basis of mechanical property variation, composition distribution, and microstructure evolution were proposed to elucidate the favorable durability of these thick films.

• 2013-11-25

著者

• Chan Yu-Chen

  Department of Material Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan

• Lee Jyh-Wei

  Department of Materials Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan

• Wei Rong-Hua

  Mechanical and Materials Engineering Division, Southwest Research Institute, San Antonio, TX 78228, U.S.A.

• Chen Hsien-Wei

  Department of Material Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan

• Duh Jenq-Gong

  Department of Material Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan

関連論文

• Fabrication of Low-Stress Plasma Enhanced Chemical Vapor Deposition Silicon Carbide Films
• Effects of Al and V Additions on Mechanical Response in Thick TiSiCN Nanocomposites Deposited Using Plasma-Enhanced Magnetron Sputtering

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