Effects of Thermal Treatment on Crystallographic and Electrical Properties of Transparent Conductive ZnO Films Deposited by Spin-Spray Method
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概要
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ZnO films were deposited by a novel aqueous solution process named the spin-spray method and thermally treated at different temperatures from 100 to 300 °C. All films had a high transmittance of 80% in the visible range and exhibited conductivity after UV illumination for 24 h. The dependence of thermal treatment temperature before UV illumination on their crystallographic and electrical properties was investigated in this study. The XRD peak intensity increased and the full width at half maximum of the (101) peak decreased from 0.35 to 0.26° for the sample thermally treated at 100 °C. From the Fourier transform infrared (FT-IR) spectra, decreases in V_{\text{as}} (COO<sup>-</sup>) and V_{\text{s}} (COO<sup>-</sup>) intensities with increasing thermal treatment temperature were observed. The resistivity after the UV illumination of the sample without thermal treatment was 4.1\times 10^{-2} \Omega cm, and it decreased to 1.6\times 10^{-2} \Omega cm in the sample thermally treated at 100 °C. The sample with the lowest resistivity exhibited a relatively high mobility of 3.3 cm<sup>2</sup>V<sup>-1</sup>s<sup>-1</sup>and a very high carrier concentration of 1.1\times 10^{20} cm<sup>-3</sup>as the solution-processed ZnO film.
- 2013-11-25
著者
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KATSUMATA Ken-ichi
Materials and Structures Laboratory, Tokyo Institute of Technology
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Okada Kiyoshi
Materials And Structures Laboratory Tokyo Institute Of Technology
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Matsushita Nobuhiro
Materials And Structure Laboratory Tokyo Institute Of Technology
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Katsumata Ken-ichi
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Hong JeongSoo
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Wagata Hajime
Department of Environmental Science and Technology, Shinshu University, Nagano 380-8533, Japan
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