Comparison of Electrochemical Luminescence Characteristics of Titanium Dioxide Films Prepared by Sputtering and Sol--Gel Combustion Methods

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Titanium dioxide (TiO<inf>2</inf>) films were deposited on fluorine-doped tin-oxide (FTO) glass by sputtering and sol--gel combustion (SGC) coating methods and investigated with respect to their electrochemical luminescence (ECL) performance. The sputtered TiO<inf>2</inf>films were denser than the SGC-deposited films, while the SGC films were found to be superior in porosity to the sputtered films. The charge transfer resistance (R_{2}) of the SGC (450 °C) TiO<inf>2</inf>-based cell was found to be lower than those of the sputtered TiO<inf>2</inf>-based cells. The SGC (450 °C) cell emitted a more intense ECL than the sputter (450 °C) cells. The threshold voltage at which the emission starts was 3.0 V for the SGC (450 °C) cell, which was lower than that (3.5 V) for the sputter (450 °C) cell. The efficiencies were 0.04 lm/W for the sputter (450 °C) cell (R_{2} = 22.3 \Omega, \text{porosity}= 27.2%) and 0.085 lm/W for the SGC (450 °C) cell (R_{2} = 12.8 \Omega, \text{porosity}= 65.8%). The SGC-deposited TiO<inf>2</inf>films were found to be superior in ECL efficiency to the sputtered TiO<inf>2</inf>films.
2013-05-25