Study of Low Pressure Inductively Coupled Plasmas: Effects of the DC Bias and Gas Flow Rate

概要

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Low pressure inductively coupled Ar/N<inf>2</inf>plasmas operating at the rf frequency of 13.56 MHz and the total gas pressure of 20 mTorr are studied in this paper. The plasma simulation is fully coupled with fluid dynamics. The gas temperature is 300 K and the input power is 300 W. 95% Ar/5% N<inf>2</inf>gas mixtures are considered. The dc bias is impressed on the substrate electrode from -20 to -100 V at the gas flow rate from 20 to 1000 sccm. It is found that the electron density increases and electron temperature in the bulk decreases when the gas flow rate increases, especially for the gas flow rate of more than 100 sccm. The electron temperature shows a large variation with the dc bias. At low dc bias, the area with high electron temperature is located within the region below the coil domain, whereas at high dc bias, the area with high electron temperature appears in the neighborhood of the substrate electrode, where the critical value is found around -50 V. The present work provides an estimation of the energies of ions arriving at the substrate and the effect of gas flows is investigated.
2013-05-25