Solution-Refined Method for Electrostatic Potential Distribution of Large-Scale Electron Optics

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概要

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• The solution-refined method is developed to solve electrostatic fields of the electron-beam direct-write lithography system. The prediction of accurate electron trajectories and the geometry of the developed photoresist patterns rely on high-resolution electrostatic fields in the whole system. Considering fabrication errors, such electrostatic fields cannot be solved using a cylindrical symmetry. Thus, this problem is a multiscale problem that requires a huge computer memory to solve. In our cases, the minimum number of grids of 1 nm length are applied and the total memory required approaches 75 Gbyte. Since the proposed solution-refined technique has a tradeoff with computational time, fewer central processing units (CPUs) are needed to solve this system because each CPU that solves the problem exceeds its available storage memory. The proposed technique can be used to solve the electron-beam direct-write lithography system at higher resolution and the problems exceed the available storage memory.

• 2013-05-25

著者

• Li Jia-Han

  National Taiwan University, Department of Engineering Science and Ocean Engineering, Taipei 10617, Taiwan

• Tsai Kuen-Yu

  National Taiwan University, Department of Electrical Engineering, Taipei 10617, Taiwan

• Yen Jia-Yush

  National Taiwan University, Department of Mechanical Engineering, Taipei 10617, Taiwan

• Lee Yen-Min

  National Taiwan University, Department of Engineering Science and Ocean Engineering, Taipei 10617, Taiwan

• Sheu Tony

  National Taiwan University, Department of Engineering Science and Ocean Engineering, Taipei 10617, Taiwan

関連論文

• Solution-Refined Method for Electrostatic Potential Distribution of Large-Scale Electron Optics

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