Kinetic Analysis of Dielectric Layer Thickness on Nitric Oxide Removal by Dielectric Barrier Discharge

概要

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The kinetic analysis of dielectric layer thickness on nitric oxide (NO) removal in dielectric barrier discharge (DBD) reactor was investigated. The simulated results show that, with the decrease of dielectric layer thickness, the electric field increases, leading to an enlarging E/N. When E/N was 250 Td, the dissociation rate and electron mean energy reached 14.3 times and 1.5 times respectively compared to when E/N was 150 Td, and their excitation rates were magnified 176, 182, 226, and 171% separately, generating more N atoms and metastable states of N<inf>2</inf>molecules. In NO/N<inf>2</inf>system, the dissociation and excitation rate of N<inf>2</inf>were related to the amount of NO removal. The experimental results show that, NO removal efficiency increased as energy density was increased and a decreasing dielectric layer thickness promoted NO removal, which coincides with simulated ones well, indicating the feasibility and the rationality of the dynamics analysis.
2013-04-25