Study of SF6/N2O Microwave Plasma for Surface Texturing of Multicrystalline (<150 μm) Solar Substrates

概要

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Surface texturing is an imperative process to reduce the reflection of the incident light on solar cells, by enhancing sunlight diffusion into the silicon solar cells for photon generation. As a result, the current generation can be increased. In this study, the plasma texturing process with linear microwave plasma sources has been benchmarked with the industrial acidic iso-texturing process on 156\times 156 mm2 multicrystalline substrates. By optimizing the plasma texturing parameters, the absolute solar cells efficiency can be increased by 4.9% for 150 μm thickness silicon substrate. The proposed process offers a significant advantage over the standard acidic iso-texturing without major modification in the existing industrial solar cells manufacturing sequence. In order to explain plasma-induced surface morphology changes, the Kardar--Parisi--Zhang (KPZ), Pétri--Brault, and Jason--Drotar models are used.
2012-10-25