Electrochemical Reactions During Ru Chemical Mechanical Planarization and Safety Considerations
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概要
- 論文の詳細を見る
We analyzed electrochemical reactions during ruthenium (Ru) chemical mechanical planarization (CMP) using a potentiostat and a quartz crystal microbalance, and considered the potential safety issues. We evaluated the valence number derived from Faraday's law using the dissolution mass change of Ru and total coulomb consumption in the electrochemical reactions for Ru in acidic solution and slurry. The valence numbers of dissolved Ru ions were distributed in the range of 2 to 3.5. As toxic ruthenium tetroxide (RuO4) has a valence number of 8, we were able to conclude that no toxic RuO4 was produced in the actual Ru CMP.
- The Japan Society of Applied Physicsの論文
- 2011-05-25
著者
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Tsujimura Manabu
Semiconductor Equipment Division, Precision Machinery Company, Ebara Corporation, Fujisawa, Kanagawa 251-8502, Japan
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Fukunaga Akira
Semiconductor Equipment Division, Precision Machinery Company, Ebara Corporation, Fujisawa, Kanagawa 251-8502, Japan
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Shima Shohei
Semiconductor Equipment Division, Precision Machinery Company, Ebara Corporation, Fujisawa, Kanagawa 251-8502, Japan
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Wada Yutaka
Semiconductor Equipment Division, Precision Machinery Company, Ebara Corporation, Fujisawa, Kanagawa 251-8502, Japan
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Tokushige Katsuhiko
Semiconductor Equipment Division, Precision Machinery Company, Ebara Corporation, Fujisawa, Kanagawa 251-8502, Japan
関連論文
- Electrochemical Reactions During Ru Chemical Mechanical Planarization and Safety Considerations
- Analysis on Copper Photocorrosion Induced by Illuminance in Chemical Mechanical Planarization Equipment Using Photodiode and Quartz Crystal Microbalance