Characterization of Deposited Films and the Electron Beam Generated in the Pulsed Plasma Deposition Gun

概要

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The channel spark discharge was used as a high-current density (up to 30 kA/cm2) relatively low-energy (${<}20$ keV) electron beam source in a pulsed plasma deposition (PPD) gun. The PPD gun was used for the deposition of thin films by pulsed ablation of different target materials, at a background gas pressure in the $10^{-3}$--$10^{-5}$ Torr range. The parameters of the electron beam generated in the modified PPD gun were studied using electrical, optical, and X-ray diagnostics. It was found that a higher background pressure stimulates a denser plasma formation between the gun output and the target, that restricts the energy delivery to the beam electrons. Namely, the efficient (up to ${\sim}74$%) transfer of the initially stored energy to the electron beam is realized at the background gas pressure of $10^{-4}$ Torr. Conversely, at a pressure of $10^{-3}$ Torr, only ${\leq}10$% of the stored energy is acquired by the energetic electrons. It was shown that the modified PPD gun, owing to the extremely high energy density delivered by the electrons to the target, may be applied for the deposition of a wide variety of different insulators, semiconductors, and metals. A selection of materials such as diamond-like carbon (DLC), cadmium telluride (CdTe), cadmium sulphide (CdS), zinc oxide (ZnO), tungsten, and tungsten carbide (WC) have been deposited as thin films and the properties and deposition rates of the deposited thin films are discussed.
2011-08-25