Optical Properties of Siloxene Films Prepared by High-Temperature Heat Treatment from Thin Films of Polysilane Containing Anthryl Groups

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We report the synthesis of linear and network polysilanes containing anthryl groups and the optical properties of the thin films by heat treatments. We observe the shift to a lower energy of the absorption edge in UV--visible absorption spectra of the thin films, when the polysilane films were heated at 500 °C. This behavior is interpreted in terms of the formation of network siloxene films by the dissociation of anthryl groups from silicon structures and the accompanying incorporation of oxygen into the silicon structures. The addition of UV irradiation before heating enhances the spectral changes caused by heat treatment. It is shown that a vacuum degree during heating and backbone structures of polysilanes affect the formation of the network siloxene structures by heat treatment.
2011-04-25